Calibre LFD

Calibre®LFD™(防石击设计)is the first production-proven EDA tool to address the urgent issue of how to manage lithographic process variability in the early stages of design creation.Calibre LFD精确模拟了平版印刷过程对“的影响。“绘制”layout data to determine the actual"建成的制造的门和金属互连的尺寸。

通过精确模拟光刻工艺对建成的布局几何图形,the Calibre LFD tool enables designers to make trade-off decisions early,从而使设计更坚固,对平版工艺窗口的敏感度更低。这种分析水平在纳米节点上很重要,where even small process variations can greatly influence silicon results.

提高产量的最大潜力

校准LFD标识布局”hot spots,“由于岩石学过程的变化,结构有更高的失效概率,and grades them to determine which have the highest potential for yield improvement.与集成Olympus-SOC™设计工具使口径LFD结果前馈,为设计人员提供建议布局改进的指导。and to enable revalidation of correct timing after modifications.

精确的平版印刷模型

为了实现Calibre LFD的精确平版建模,铸造厂以设计规则检查(DRC)工具包的相同方式为设计人员的工艺提供了一个LFD工具包。然后,设计师可以运行模拟,以查看在铸造厂特定的平版印刷过程中,布局将如何执行的准确描述。目标是将设计驱动到LFD清洁以及“DRC清洁sign-off.有了口径LFD套件,设计师可以创建设计,并与铸造具体的口径LFD验证,以确保他们在提交给铸造制造过程之前没有光刻热点。

特点和优点

  • Results in a"DRC清洁and"LFD-clean"签署
  • Gives users the ability to improve yield by creating a design that is less sensitive to variations in a given manufacturing process.
  • Uses product-proven RET recipes and process models to simulate lithography effects.
  • LFD Kit predicts and captures areas of potential design failure due to the manufacturing process and specific process conditions and communicates issues to the designer for possible layout modification.
  • 设计可变性索引(DVI?)提供的数据可帮助设计人员决定哪种布局配置最适合增强对流程变化的稳健性。
  • LFD数据报告以用户友好的DRC类型形式呈现,可分类,对可能的解决方案进行分类并包含注释,all within the design environment.
  • 易于集成到交互和迭代过程的设计流程中。
  • 与Calibre平台完全集成,流行的布局环境和行业标准格式。
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